Low InterfacialContact Resistance between Carbon-BasedGas Diffusion Layer and Sputter-Deposited Anatase TiO2
カーボン系ガス拡散層とスパッタ成膜アナターゼ型TiO2の低界面接触抵抗 (AI 翻訳)
Tomohito Sudare, Reiichi Ueda, Yumie Miura, Ayaka Nakamura, Xu Ha, Ryo Nakayama, Kazunori Nishio, Ryota Shimizu, Naoomi Yamada, Taro Hitosugi
🤖 gxceed AI 要約
日本語
本論文は、燃料電池のセパレータとガス拡散層の界面接触抵抗を低減するため、ステンレス鋼上にRFマグネトロンスパッタで成膜したNbドープTiO2(TNO)薄膜が、炭素系ガス拡散層に対して2.6 mΩ cm2の低接触抵抗を示すことを実証した。500℃の真空アニールが抵抗低減に有効で、高キャリア密度が鍵となる。TNOは次世代高出力燃料電池の有望な無機コーティング材料である。
English
This paper demonstrates that Nb-doped TiO2 (TNO) thin films deposited on stainless steel separators by RF magnetron sputtering achieve a low interfacial contact resistance of 2.6 mΩ cm2 against carbon-based gas diffusion layers, meeting the target for high-power fuel cells. Post-deposition vacuum annealing at 500°C reduces resistance, and high carrier density is key. TNO is a promising coating for next-generation fuel cells.
Unofficial AI-generated summary based on the public title and abstract. Not an official translation.
📝 gxceed 編集解説 — Why this matters
日本のGX文脈において
日本の水素社会実現に向けた燃料電池技術の高度化に寄与する材料研究であり、自動車や定置用燃料電池の高性能化に貢献する。ただし、直接的な政策や開示制度との関連は薄いが、水素関連産業の競争力強化に資する。
In the global GX context
This material science advance supports the global push for efficient fuel cells, a key technology for decarbonizing transport and stationary power. It contributes to the hydrogen economy and may influence supply chain decisions in the automotive and energy sectors.
👥 読者別の含意
🔬研究者:Fuel cell material researchers can leverage TNO coatings to reduce contact resistance and improve performance.
🏢実務担当者:Companies in fuel cell manufacturing can consider TNO coatings for separator plates to meet performance targets.
🏛政策担当者:Policymakers supporting hydrogen infrastructure may note this technology as a step toward cost-effective fuel cells.
📄 Abstract(原文)
Abstract Reducing the interfacial contact resistance between separators and gas diffusion layers is critical for achieving high-power polymer-electrolyte membrane fuel cells. Stringent targets for contact resistance below 3.0 mΩ cm2 have been proposed; however, achieving such values using practical separator materials remains challenging. Here, we demonstrate that electrically conductive anatase Nb-doped TiO2 (TNO) thin films deposited onto stainless steel separators by RF magnetron sputtering exhibit a low contact resistance of 2.6 mΩ cm2 against carbon-based gas diffusion layers. Postdeposition vacuum annealing at 500 °C, suitable for practical stainless steel, reduces contact resistance. X-ray diffraction, electron backscattering diffraction, and Raman spectroscopy mapping reveal that a high carrier density (∼1021 cm–3) in Nb-doped TiO2 thin films plays a key role in reducing interfacial contact resistance. These findings highlight TNO as a promising inorganic coating material for next-generation high-power fuel cells.
🔗 Provenance — このレコードを発見したソース
- openalex https://doi.org/10.1021/acs.jpcc.6c03136first seen 2026-08-15 04:52:33
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